CVD Growth of N-Doped Carbon Nanotubes on Silicon Substrates and Its Mechanism-Reference-Cited by-同舟云学术

CVD Growth of N-Doped Carbon Nanotubes on Silicon Substrates and Its Mechanism

Published:2005-04-15 Issue:19 Volume:109 Page:9275-9279
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

He Maoshuai¹,Zhou Shuang¹,Zhang Jin¹,Liu Zhongfan¹,Robinson Colin¹

Affiliation:

1. Key Laboratory for the Physics and Chemistry of Nanodevices, Center for Nanoscale Science and Technology (CNST), College of Chemistry & Molecular Engineering, Peking University, Beijing 100871, People's Republic of China, and Division of Oral Biology, University of LEEDS, Clarendon Way, Leeds LS2 9LU, UK

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp044868d

Reference34 articles.

1. Helical microtubules of graphitic carbon

2. Nanomechanics of Carbon Tubes: Instabilities beyond Linear Response

3. Nanobeam Mechanics: Elasticity, Strength, and Toughness of Nanorods and Nanotubes

4. Nanometre-scale rolling and sliding of carbon nanotubes

5. Self-Oriented Regular Arrays of Carbon Nanotubes and Their Field Emission Properties

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