Tailoring the Properties of Atomic Layer Deposited Nickel and Nickel Carbide Thin Films via Chain-Length Control of the Alcohol Reducing Agents-Reference-Cited by-同舟云学术

Tailoring the Properties of Atomic Layer Deposited Nickel and Nickel Carbide Thin Films via Chain-Length Control of the Alcohol Reducing Agents

Published:2014-09-25 Issue:40 Volume:118 Page:23385-23392
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Sarr Mouhamadou¹,Bahlawane Naoufal¹,Arl Didier¹,Dossot Manuel²,McRae Edward³,Lenoble Damien¹

Affiliation:

1. Centre de Recherche Public Gabriel Lippmann, 41, rue du Brill L-4422 Belvaux, Luxembourg

2. Laboratory of Physical Chemistry and Microbiology for the Environment, UMR CNRS-Université de Lorraine 7564, 405 rue de Vandoeuvre 54601 Villers-lès-Nancy, France

3. Institut Jean Lamour, UMR 7198 CNRS-Université de Lorraine, FST, BP 70239, 54506 Vandoeuvre-lès-Nancy, France

Funder

Agence Nationale de la Recherche

Fonds National de la Recherche Luxembourg

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp5068318

Reference41 articles.

1. Compact Performance Models and Comparisons for Gigascale On-Chip Global Interconnect Technologies

2. Electrical transport and electromigration studies on nickel encapsulated carbon nanotubes: possible future interconnects

3. Electrical resistivity of copper and nickel thin‐film interconnections

4. Optical metrology of Ni and NiSi thin films used in the self-aligned silicidation process

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