Photoion Alignment: Chemical Signatures 200 eV above Threshold-Reference-Cited by-同舟云学术

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Photoion Alignment: Chemical Signatures 200 eV above Threshold

Published:1995-02 Issue:6 Volume:99 Page:1741-1747
ISSN:0022-3654
Container-title:The Journal of Physical Chemistry
language:en
Short-container-title:J. Phys. Chem.

Author:

Das Romith,Wu Chuanyong,Mihill A. G.,Poliakoff E. D.,Wang Kwanghsi,McKoy V.

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry,General Engineering

Link

https://pubs.acs.org/doi/pdf/10.1021/j100006a016

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Calculation of Photo-Ionisation Cross Sections and Radiative Recombination Rate Coefficients for CO and CO+Molecules;Plasma Science and Technology;2014-11

2. Vibrational branching ratios in the photoelectron spectra of N2 and CO: interference and diffraction effects;Physical Chemistry Chemical Physics;2012

3. Valence photoelectron spectroscopy of N2 and CO: Recoil-induced rotational excitation, relative intensities, and atomic orbital composition of molecular orbitals;The Journal of Chemical Physics;2010-11-07

4. Photochemical synthesis of Bi 2 S 3 nanoflowers on an alumina template;Inorganic Chemistry Communications;2004-07

5. Photochemical synthesis and characterization of Bi2S3 nanofibers;Materials Science and Engineering: B;2004-07

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