Nanoscale Bilayer Mechanical Lithography Using Water as Developer-Reference-Cited by-同舟云学术

Nanoscale Bilayer Mechanical Lithography Using Water as Developer

Published:2021-04-22 Issue:9 Volume:21 Page:3827-3834
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Shu Yu¹,Porter Benjamin F.¹,Soh Eugene J. H.¹,Farmakidis Nikolaos¹,Lim Seongdong¹,Lu Yang¹,Warner Jamie H.²³^ORCID,Bhaskaran Harish¹^ORCID

Affiliation:

1. Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom

2. Walker Department of Mechanical Engineering, The University of Texas at Austin, 204 East Dean Keeton Street, Austin, Texas 78712, United States

3. Materials Graduate Program, Texas Materials Institute, The University of Texas at Austin, 204 East Dean Keeton Street, Austin, Texas 78712, United States

Funder

Engineering and Physical Sciences Research Council

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.nanolett.1c00251

Reference39 articles.

1. Electronics based on two-dimensional materials

2. Advanced Carbon for Flexible and Wearable Electronics

3. Graphene transistors

4. Two-dimensional flexible nanoelectronics

5. Electronics and optoelectronics of two-dimensional transition metal dichalcogenides

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Additive manufacturing of 3D surface microstructures through repetitively nucleated plasmonic bubbles;Surfaces and Interfaces;2024-01

2. Exploiting rotational asymmetry for sub-50 nm mechanical nanocalligraphy;Microsystems & Nanoengineering;2021-10-20