Atomic Layer Deposition of Ga2O3 Films Using Trimethylgallium and Ozone
Author:
Affiliation:
1. Energy Systems Division, Argonne National Laboratory, 9700 South Cass Avenue, Argonne, Illinois 60439, United States
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm300712x
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