Surface Interactions of NH2 Radicals in NH3 Plasmas
Author:
Affiliation:
1. Department of Chemistry, Colorado State University, Fort Collins, Colorado 80523-1872
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp9909558
Reference41 articles.
1. A comparative study of the effects of ammonia and hydrogen plasma downstream treatment on the surface modification of polytetrafluoroethylene
2. Comparison of the efficiency of N2 and NH3 plasma treatments to improve the adhesion of PP films to in situ deposited Al coatings. Study of ageing phenomena in terms of acid-base properties
3. Effects of NH/sub 3/ plasma passivation on N-channel polycrystalline silicon thin-film transistors
4. Thermal and plasma‐assisted nitridation of GaAs(100) using NH3
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