Reversible Tetrahedral-Site Migration Inducing an Additional Charge Compensation Reaction in Li-Rich Layered Oxide 0.4Li2MnO3–0.6LiNi0.5Mn0.5O2

Author:

Oishi Masatsugu1ORCID,Kawaguchi Tomoya2ORCID,Fujita Yusuke1,Izumi Masaya1,Hiroi Satoshi3ORCID,Ohara Koji34,Okamoto Norihiko L.2ORCID,Ichitsubo Tetsu2ORCID

Affiliation:

1. Graduate School of Technology, Industrial and Social Sciences, Tokushima University, 2-1 Minami, Josanjima-cho, Tokushima 770-8506, Japan

2. Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aobaku, Sendai, Miyagi 980-8577, Japan

3. Faculty of Materials for Energy, Shimane University, 1060 Nishikawatsu-cho, Matsue, Shimane 690-8504, Japan

4. Diffraction and Scattering Division, Japan Synchrotron Radiation Research Institute (JASRI), 1−1−1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679−5198, Japan

Funder

Institute for Materials Research, Tohoku University

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

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