Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films-Reference-Cited by-同舟云学术

Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films

Published:2018-05-07 Issue:10 Volume:30 Page:3499-3507
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Väyrynen Katja¹^ORCID,Hatanpää Timo¹^ORCID,Mattinen Miika¹^ORCID,Heikkilä Mikko¹,Mizohata Kenichiro²,Meinander Kristoffer²,Räisänen Jyrki²,Ritala Mikko¹,Leskelä Markku¹

Affiliation:

1. Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014 Helsinki, Finland

2. Department of Physics, University of Helsinki, P.O. Box 43, FI-00014 Helsinki, Finland

Funder

Academy of Finland

ASM Microchemistry Oy

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.8b01271

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