Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
Author:
Affiliation:
1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands
2. Philips Innovation Labs, High Tech Campus 11, 5656 AE Eindhoven, The Netherlands
Funder
Stichting voor Fundamenteel Onderzoek der Materie
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
http://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.6b04368
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1. Giant Intrinsic Carrier Mobilities in Graphene and Its Bilayer
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