Site-Selective Atomic Layer Deposition at Thermally Generated Surface Oxygen Vacancies on Rutile TiO<sub>2</sub>-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Site-Selective Atomic Layer Deposition at Thermally Generated Surface Oxygen Vacancies on Rutile TiO₂

Published:2023-03-24 Issue:7 Volume:35 Page:2857-2863
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Jones Jessica C.¹^ORCID,Kamphaus Ethan P.¹^ORCID,Guest Jeffrey R.²^ORCID,Mane Anil U.³,Cheng Lei¹^ORCID,Martinson Alex B. F.¹^ORCID

Affiliation:

1. Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States

2. Center for Nanoscale Materials, Argonne National Laboratory, Lemont, Illinois 60439, United States

3. Applied Materials Division, Argonne National Laboratory, Lemont, Illinois 60439, United States

Funder

Basic Energy Sciences

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.2c03679

Reference41 articles.

1. Stabilization of point-defect spin qubits by quantum wells

2. Liquid Water- and Heat-Resistant Hybrid Perovskite Photovoltaics via an Inverted ALD Oxide Electron Extraction Layer Design

3. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

4. Atomic layer deposition of h-BN(0001) multilayers on Ni(111) and chemical vapor deposition of graphene on h-BN(0001)/Ni(111)

5. Design and implementation of an integral wall-mounted quartz crystal microbalance for atomic layer deposition

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechanistically Informed Strategies for Site-Selective Atomic Layer Deposition;Chemistry of Materials;2024-09-13

2. Effects of oxygen sources on the growth characteristics and dielectric properties of atomic-layer-deposited TiO2 films for aluminum electrolytic capacitors;Journal of Solid State Chemistry;2024-09

3. Theoretical Design Strategies for Area-Selective Atomic Layer Deposition;Chemistry of Materials;2024-05-22

4. Nucleation dependence of atomic layer deposition on diamond surface termination;Carbon;2023-09

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3