“Dual-Tone” Area-Selective Deposition: Selectivity Inversion of Polymer on Patterned Si/SiO<sub>2</sub> Starting Surfaces-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

“Dual-Tone” Area-Selective Deposition: Selectivity Inversion of Polymer on Patterned Si/SiO₂ Starting Surfaces

Published:2024-02-27 Issue:8 Volume:36 Page:3655-3665
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Carroll Nicholas M.¹^ORCID,Margavio Hannah R. M.¹^ORCID,Parsons Gregory N.¹^ORCID

Affiliation:

1. Department of Chemical and Biomolecular Engineering, North Carolina State University, 911 Partners Way, Raleigh, North Carolina 27606, United States

Funder

Semiconductor Research Corporation

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.3c03158

Reference32 articles.

1. The era of hyper-scaling in electronics

2. Area-Selective Deposition: Fundamentals, Applications, and Future Outlook

3. A 3-nm Gate-All-Around SRAM Featuring an Adaptive Dual-Bitline and an Adaptive Cell-Power Assist Circuit

4. Nanoparticle photoresist studies for EUV lithography

5. The economic impact of EUV lithography on critical process modules

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photocatalytic Surface Initiation for Area-Selective Chemical Vapor Deposition of Polymer Thin Film;ACS Materials Letters;2024-08-05

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP