Limits to Hole Mobility and Doping in Copper Iodide

Author:

Willis Joe12ORCID,Claes Romain3,Zhou Qi12,Giantomassi Matteo3,Rignanese Gian-Marco3ORCID,Hautier Geoffroy34,Scanlon David O.125ORCID

Affiliation:

1. Department of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ, U.K.

2. Thomas Young Centre, University College London, Gower Street, London WC1E 6BT, U.K.

3. UCLouvain, Institute of Condensed Matter and Nanosciences (IMCN), Chemin des Étoiles 8, Louvain-la-Neuve B-1348, Belgium

4. Thayer School of Engineering, Dartmouth College, Hanover, New Hampshire 03755, United States

5. School of Chemistry, University of Birmingham, Edgbaston, Birmingham B15 2TT, U.K.

Funder

Engineering and Physical Sciences Research Council

Fédération Wallonie-Bruxelles

Basic Energy Sciences

Diamond Light Source

H2020 Research Infrastructures

Fonds De La Recherche Scientifique - FNRS

H2020 European Research Council

Waalse Gewest

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

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