Atomic Layer Deposition of Metal Fluorides Using HF–Pyridine as the Fluorine Precursor-Reference-Cited by-同舟云学术

Atomic Layer Deposition of Metal Fluorides Using HF–Pyridine as the Fluorine Precursor

Published:2016-03-15 Issue:7 Volume:28 Page:2022-2032
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Lee Younghee¹,Sun Huaxing¹,Young Matthias J.¹,George Steven M.¹

Affiliation:

1. Department of Chemistry and Biochemistry, ‡Department of Chemical and Biological Engineering, and §Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309, United States

Funder

Division of Chemistry

U.S. Department of Energy

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.5b04360

Reference56 articles.

1. Fluoride compounds for IR coatings

2. Optical and durability properties of infrared transmitting thin films

3. Development of optical coatings for 157-nm lithography I Coating materials

4. The design and synthesis of Heterogeneous Catalyst Systems

5. Amorphous Metal Fluorides with Extraordinary High Surface Areas

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