A New Route to Monolithic Methylsilsesquioxanes: Gelation Behavior of Methyltrimethoxysilane and Morphology of Resulting Methylsilsesquioxanes under One-Step and Two-Step Processing-Reference-Cited by-同舟云学术

A New Route to Monolithic Methylsilsesquioxanes: Gelation Behavior of Methyltrimethoxysilane and Morphology of Resulting Methylsilsesquioxanes under One-Step and Two-Step Processing

Published:2005-05-01 Issue:11 Volume:17 Page:2807-2816
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Dong Hanjiang¹,Brook Michael A.¹,Brennan John D.¹

Affiliation:

1. Department of Chemistry, McMaster University, 1280 Main Street West, Hamilton, Ontario, L8S 4M1, Canada

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm050271e

Reference59 articles.

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2. Perry, R. J.; Adams, M. E. InSilicones and Silicone-ModifiedMaterials; Clarson, S. J., Fitzgerald, J. J., Owen, M. J., Smith, S. D., Eds.; American Chemical Society: Washington, DC, 2000; Vol. 728, p 533.

3. Polyhedral oligosilsesquioxanes and their homo derivatives

4. Low-Dielectric, Nanoporous Organosilicate Films Prepared via Inorganic/Organic Polymer Hybrid Templates

5. Nanoporous Ultralow Dielectric Constant Organosilicates Templated by Triblock Copolymers

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