Multiple Proton Diffusion and Film Densification in Atomic Layer Deposition Modeled by Density Functional Theory
Author:
Affiliation:
1. Tyndall National Institute, University College Cork, Lee Maltings, Cork, Ireland
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm303630e
Reference27 articles.
1. Structural and Electrical Properties of HfO2/n-InxGa1-xAs structures (x: 0, 0.15, 0.3 and 0.53)
2. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
3. Growth Studies and Reaction Mechanism of the Atomic Layer Deposition of Hafnium Oxide
4. Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
5. Density functional theory study of HfCl4, ZrCl4, and Al(CH3)3 decomposition on hydroxylated SiO2: Initial stage of high-k atomic layer deposition
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