Comparison of CuxS Films Grown by Atomic Layer Deposition and Chemical Vapor Deposition
Author:
Affiliation:
1. Laboratory for Inorganic Chemistry, Delft University of Technology, Julianalaan 136, 2628 BL Delft, The Netherlands
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm035238b
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