Chemical Vapor Deposition Growth of Silicon Nanowires with Diameter Smaller Than 5 nm-Reference-Cited by-同舟云学术

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Chemical Vapor Deposition Growth of Silicon Nanowires with Diameter Smaller Than 5 nm

Published:2019-10-25 Issue:19 Volume:4 Page:17967-17971
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Puglisi Rosaria A.¹^ORCID,Bongiorno Corrado¹,Caccamo Sebastiano¹,Fazio Enza²,Mannino Giovanni¹,Neri Fortunato²,Scalese Silvia¹^ORCID,Spucches Daniele²,La Magna Antonino¹

Affiliation:

1. CNR Istituto per la Microelettronica e Microsistemi, Strada Ottava 5, Zona Industriale, 95121 Catania, Italy

2. Dipartimento Scienze Matematiche ed Informatiche, Scienze Fisiche e Scienze della Terra, Università degli Studi di Messina, F. Stagno d’Alcontres, 31, 98166 Messina, Italy

Funder

National Program BEYOND NANO Upgrade

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.acs.org/doi/pdf/10.1021/acsomega.9b01488

Reference27 articles.

1. Functional Nanoscale Electronic Devices Assembled Using Silicon Nanowire Building Blocks

3. A review on electronic and optical properties of silicon nanowire and its different growth techniques

4. Fabrication and STEM/EELS measurements of nanometer-scale silicon tips and filaments

5. Enhanced direct interband transitions in silicon nanowires studied by electron energy-loss spectroscopy

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