Structural Analysis of Si(OEt)<sub>4</sub> Deposits on Au(111)/SiO<sub>2</sub> Substrates at the Nanometer Scale Using Focused Electron Beam-Induced Deposition-Reference-Cited by-同舟云学术

Structural Analysis of Si(OEt)₄ Deposits on Au(111)/SiO₂ Substrates at the Nanometer Scale Using Focused Electron Beam-Induced Deposition

Published:2023-06-28 Issue:27 Volume:8 Page:24233-24246
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Mason Nigel J.¹,Pintea Maria¹^ORCID,Csarnovics István²^ORCID,Fodor Tamás³^ORCID,Szikszai Zita³,Kertész Zsófia³

Affiliation:

1. School of Physical Sciences, University of Kent, Ingram Building, Room 201, Canterbury CT2 7NZ, United Kingdom

2. Department of Experimental Physics, Institute of Physics, Faculty of Science and Technology, University of Debrecen, Bem sq 18a, Debrecen 4032, Hungary

3. Laboratory of Materials Science, Institute for Nuclear Research, Bem tér 18/c, Debrecen 4026, Hungary

Funder

H2020 Marie Sklodowska-Curie Actions

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsomega.3c00793

Reference59 articles.

1. A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide

2. Structural and Vibrational Properties of Silyl (SiH3–) Anions in KSiH3 and RbSiH3: New Insight into Si–H Interactions

3. Valence-bond studies on SiH3

4. Analysis of surface adsorption kinetics of SiH4 and Si2H6 for deposition of a hydrogenated silicon thin film using intermediate pressure SiH4 plasmas

5. Baron, A. R., Chemistry of Electronic Materials, 2011, online: cnx.org/contents/EJYWe4UY@9.4:5ZO2KMJr@3/Introduction-to-Semiconductors/.

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