Adsorption Behaviors of Chlorosilanes, HCl, and H<sub>2</sub> on the Si(100) Surface: A First-Principles Study-Reference-Cited by-同舟云学术

Adsorption Behaviors of Chlorosilanes, HCl, and H₂ on the Si(100) Surface: A First-Principles Study

Published:2022-11-10 Issue:46 Volume:7 Page:42105-42114
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Wang Yajun¹²,Nie Zhifeng¹^ORCID,Guo Qijun¹^ORCID,Song Yumin¹,Liu Li³⁴

Affiliation:

1. Yunnan Key Laboratory of Metal-Organic Molecular Materials and Device, School of Chemistry and Chemical Engineering, Kunming University, Kunming650214, China

2. School of Physical Science and Technology, Kunming University, Kunming650214, China

3. School of Metallurgy and Energy Engineering, Kunming University of Science and Technology, Kunming650093, China

4. Kunming Engineering & Research Institute of Nonferrous Metallurgy Co., Ltd., Kunming650051, China

Funder

Yunnan Provincial Department of Education

National Natural Science Foundation of China

Kunming City

Special Basic Cooperative Research Programs of Yunnan Provincial Undergraduate Universities’ Association

Yunnan Province

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsomega.2c04502

Reference50 articles.

1. Electrodeposition of crystalline silicon films from silicon dioxide for low-cost photovoltaic applications

2. Planning of intensified production of solar grade silicon to yield solar panels involving behavior of population

3. Mathematical model and energy efficiency analysis of Siemens reactor with a quartz ceramic lining

4. Discussion on hydrogen quality detection methods for polysilicon production

5. New processes for the production of solar-grade polycrystalline silicon: A review

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