Thermal Probe Maskless Lithography for 27.5 nm Half-Pitch Si Technology-Reference-Cited by-同舟云学术

Thermal Probe Maskless Lithography for 27.5 nm Half-Pitch Si Technology

Published:2013-08-23 Issue:9 Volume:13 Page:4485-4491
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Cheong Lin Lee¹²,Paul Philip¹,Holzner Felix¹,Despont Michel¹,Coady Daniel J.³,Hedrick James L.³,Allen Robert³,Knoll Armin W.¹,Duerig Urs¹

Affiliation:

1. IBM Research—Zurich, Säumerstrasse 4, CH-8803 Rüschlikon, Switzerland

2. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, 77 Massachusetts Ave, Cambridge, Massachusetts 02139, United States

3. IBM Research—Almaden, 650 Harry Road, San Jose, California 95120, United States

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl4024066

Reference27 articles.

1. Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes

2. Rapid turnaround scanning probe nanolithography

3. Nanopatterning materials using area selective atomic layer deposition in conjunction with thermochemical surface modification via heated AFM cantilever probe lithography

4. High-Speed, Sub-15 nm Feature Size Thermochemical Nanolithography

5. Nanoscale thermal lithography by local polymer decomposition using a heated atomic force microscope cantilever tip

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