XPS Study of Interface and Ligand Effects in Supported Cu2O and CuO Nanometric Particles-Reference-Cited by-同舟云学术

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XPS Study of Interface and Ligand Effects in Supported Cu2O and CuO Nanometric Particles

Published:2005-04-01 Issue:16 Volume:109 Page:7758-7765
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Morales J.¹,Espinos J. P.¹,Caballero A.¹,Gonzalez-Elipe A. R.¹,Mejias Jose Antonio²

Affiliation:

1. Instituto de Ciencia de Materiales de Sevilla (CSIC-University Sevilla) and Dpt. Q. Inorganica, Avda. Americo Vespucio s/n, 41092 Sevilla, Spain

2. Departamento de Ciencias Ambientales, Universidad Pablo de Olavide, Ctra Utrera km 1, E−41013 Sevilla, Spain

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp0453055

Reference32 articles.

1. Chemical shifts of Auger lines, and the Auger parameter

2. Auger parameter and Wagner plot in the characterization of chemical states by X-ray photoelectron spectroscopy: a review

3. SPECTROSCOPIC CHARACTERIZATION OF OXIDE/OXIDE INTERFACES

4. Electronic state and catalytic activity of SiO2 doped γ-Al2O3

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