Dielectric Constant Enhancement and Leakage Current Suppression of Metal–Insulator–Metal Capacitors by Atomic Layer Annealing and the Capping Layer Effect Prepared with a Low Thermal Budget
Author:
Affiliation:
1. Department of Materials Science and Engineering, National Taiwan University, Taipei 10617, Taiwan
Funder
National Science and Technology Council
Taiwan Semiconductor Manufacturing Company
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acsaelm.2c01287
Reference75 articles.
1. BEOL Compatible High-Capacitance MIMCAP Structure Using a Novel High k Material
2. MIM Capacitor Integration for Mixed-Signal/RF Applications
3. Investigation of Leakage Current in Micro M-I-M Structure Using Multilayer High-K Dielectric Materials with COMSOL Multiphysics
4. ALD based Metal-insulator-metal (MIM) Nanocapacitors for Energy Storage
5. Three-Dimensional Metal-Insulator-Metal Decoupling Capacitors with Optimized ZrO2 ALD Properties for Improved Electrical and Reliability Parameters
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