In Situ Growth of CVD Graphene Directly on Dielectric Surface toward Application-Reference-Cited by-同舟云学术

In Situ Growth of CVD Graphene Directly on Dielectric Surface toward Application

Author:

Dong Yibo¹,Guo Sheng,Mao Huahai²³,Xu Chen¹,Xie Yiyang¹,Deng Jun¹,Wang Le¹,Du Zaifa¹,Xiong Fangzhu¹,Sun Jie¹^ORCID

Affiliation:

1. Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing 100124, China

2. Materials Science and Engineering, KTH Royal Institute of Technology, Brinellvägen 23, SE-100 44 Stockholm, Sweden

3. Thermo-Calc Software AB, Råsundavägen 18, SE-169 67 Solna, Sweden

Funder

Ministry of Science and Technology of the People's Republic of China

Beijing Municipal Commission of Education

Natural Science Foundation of Beijing Municipality

Swedish Foundation for International Cooperation in Research and Higher Education

National Natural Science Foundation of China

Beijing Municipal Commission of Science and Technology

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Link

Reference41 articles.

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