X-ray Photoelectron Spectroscopy Depth Profiling of La2O3/Si Thin Films Deposited by Reactive Magnetron Sputtering
Author:
Affiliation:
1. Department of Mechanical Engineering, University of Texas at El Paso, El Paso, Texas 79968, United States
2. Physical Department, Novosibirsk State University, Novosibirsk, 630090, Russia
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am201021m
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