Native Oxide Transport and Removal During Atomic Layer Deposition of TiO2 Films on GaAs(100) Surfaces
Author:
Affiliation:
1. Department of Physics, UMBC, Baltimore, Maryland 21250, United States
Funder
National Science Foundation
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.5b08998
Reference56 articles.
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4. Atomic Layer Deposition of Nanostructured Materials
5. GaAs metal-oxide-semiconductor device with HfO2∕TaN gate stack and thermal nitridation surface passivation
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