Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST-Reference-Cited by-同舟云学术

Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST

Published:2015-06-10 Issue:24 Volume:7 Page:13476-13483
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Cushen Julia¹,Wan Lei¹,Blachut Gregory²,Maher Michael J.³,Albrecht Thomas R.¹,Ellison Christopher J.²,Willson C. Grant²³,Ruiz Ricardo¹

Affiliation:

1. HGST, a Western Digital Company, 3403 Yerba Buena Rd., San Jose, California 95135, United States

2. The University of Texas at Austin, McKetta Department of Chemical Engineering, 200 E Dean Keeton St. Stop C0400, Austin, Texas 78712, United States

3. The University of Texas at Austin, Department of Chemistry, 105 E. 24th St. Stop A5300, Austin, Texas 78712, United States

Funder

Nissan Chemical Company

Welch Foundation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.5b02481

Reference47 articles.

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5. Rectangular Patterns Using Block Copolymer Directed Assembly for High Bit Aspect Ratio Patterned Media

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