Oxidation of Nitrided Si(100) by Gaseous Atomic and Molecular Oxygen
Author:
Affiliation:
1. Department of Chemical Engineering, P.O. Box 116005, University of Florida, Gainesville, Florida 32611
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp044434i
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1. Ultrathin silicon oxynitride formed by low-energy electron impact plasma nitridation and chemical oxidation methods
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