In Situ Reaction Mechanism Studies on the Atomic Layer Deposition of Al2O3 from (CH3)2AlCl and Water
Author:
Affiliation:
1. Laboratory of Inorganic Chemistry, Department of Chemistry, P.O. Box 55, University of Helsinki, Helsinki FI-00014, Finland
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la047153a
Reference22 articles.
1. Atomic layer epitaxy
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4. Studies on the morphology of Al2O3 thin films grown by atomic layer epitaxy
5. Sequential surface chemical reaction limited growth of high quality Al2O3dielectrics
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