Precursor Oxidation State Control of Film Stoichiometry in the Metal−Organic Chemical Vapor Deposition of Tin Oxide Thin Films-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Precursor Oxidation State Control of Film Stoichiometry in the Metal−Organic Chemical Vapor Deposition of Tin Oxide Thin Films

Published:1997-03-01 Issue:3 Volume:9 Page:730-735
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Suh Seigi,Hoffman David M.,Atagi Lauren M.,Smith David C.,Liu Jia-Rui,Chu Wei-Kan

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm960423t

Reference35 articles.

1. Transparent conductors—A status review

2. Properties of fluorine-doped tin oxide films produced by atmospheric pressure chemical vapor deposition from tetramethyltin, bromotrifluoromethane and oxygen

3. Pyrolytic properties of di-n-butyltin(IV) diacetate as a precursor for sprayed SnO2 thin films

4. The growth of thin, epitaxial SnO2 films for gas sensing applications

5. Electrical properties of non-stoichiometric tin oxide films obtained by the d.c. reactive sputtering method

Cited by 33 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Oxidative Addition of Alkyl Iodides to [Sn(NMe₂)₂]₂: In Situ Generation of RSn(NMe₂)₃ Compounds;Organometallics;2024-04-24

2. Structural studies of main group organometallic single-source precursors for MOCVD;Nanomaterials via Single-Source Precursors;2022

3. Al/Ga co-doped V6O13 nanorods with high discharge specific capacity as cathode materials for lithium-ion batteries;Journal of Electroanalytical Chemistry;2021-06

4. Heteroleptic Tin(IV) Aminoalkoxides and Aminofluoroalkoxides as MOCVD Precursors for Undoped and F-Doped SnO2 Thin Films;Inorganic Chemistry;2020-04-27

5. Perfluorinated tert -Butoxides of Tin(II): The Dimeric Alkoxide and Its Monomeric Ate Complex;Zeitschrift für anorganische und allgemeine Chemie;2018-10-29

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3