Robust Topological States in Bi2Se3 against Surface Oxidation-Reference-Cited by-同舟云学术

Robust Topological States in Bi2Se3 against Surface Oxidation

Published:2020-02-25 Issue:11 Volume:124 Page:6253-6259
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Yang Jiali¹²^ORCID,Zheng Baobing²³^ORCID,Chen Zhongjia²⁴,Xu Wangping¹²,Wang Rui¹²^ORCID,Xu Hu²⁵^ORCID

Affiliation:

1. Institute for Structure and Function & Department of Physics, Chongqing University, Chongqing 400044, P. R. China

2. Department of Physics and Institute for Quantum Science and Engineering, Southern University of Science and Technology, Shenzhen 518055, P. R. China

3. College of Physics and Optoelectronic Technology, Nonlinear Research Institute, Baoji University of Arts and Sciences, Baoji 721016, P. R. China

4. Department of Physics, South China University of Technology, Guangzhou 510640, P. R. China

5. Guangdong Provincial Key Laboratory of Computational Science and Material Design, Southern University of Science and Technology, Shenzhen 518055, P. R. China

Funder

National Natural Science Foundation of China

Fundamental Research Funds for the Central Universities of China

Chongqing Natural Science Funds

Guangdong Natural Science Foundation for Distinguished Young Scholars

Guangdong Provincial Key Laboratory of Computational Science and Material Design, Southern University of Science and Technology

Center for Computational Science and Engineering, Southern University of Science and Technology

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link