AlCl3-Dosed Si(100)-2 × 1: Adsorbates, Chlorinated Al Chains, and Incorporated Al-Reference-Cited by-同舟云学术

AlCl3-Dosed Si(100)-2 × 1: Adsorbates, Chlorinated Al Chains, and Incorporated Al

Published:2021-05-19 Issue:21 Volume:125 Page:11336-11347
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Radue Matthew S.¹,Baek Sungha²,Farzaneh Azadeh³,Dwyer K. J.²^ORCID,Campbell Quinn⁴^ORCID,Baczewski Andrew D.⁴,Bussmann Ezra⁵,Wang George T.⁵^ORCID,Mo Yifei³^ORCID,Misra Shashank⁵,Butera R. E.¹^ORCID

Affiliation:

1. Laboratory for Physical Sciences, 8050 Greenmead Drive, College Park, Maryland 20740, United States

2. Department of Physics, University of Maryland, College Park, Maryland 20742, United States

3. Department of Materials Science and Engineering, University of Maryland, College Park, Maryland 20742, United States

4. Center for Computing Research, Sandia National Labortaries, Albuquerque, New Mexico 87185, United States

5. Sandia National Laboratories, Albuquerque, New Mexico 87185, United States

Funder

Sandia National Laboratories

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.1c00691

Reference66 articles.

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3. Controlled removal of hydrogen atoms from H-terminated silicon surfaces

4. Low thermal budget high-k/metal surface gate for buried donor-based devices

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