A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO<sub>2</sub> Atomic Layer Deposition-Reference-Cited by-同舟云学术

A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO₂ Atomic Layer Deposition

Published:2023-05-22 Issue:21 Volume:127 Page:10303-10314
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Kaneda Yukio¹^ORCID,Nye Rachel A.²³⁴^ORCID,Marques Esteban A.³⁴^ORCID,Armini Silvia³^ORCID,Delabie Annelies³⁴^ORCID,van Setten Michiel J.³^ORCID,Pourtois Geoffrey³^ORCID

Affiliation:

1. Sony Semiconductor Solutions, Asahi-cho 4-14-1, Atsugi, Kanagawa 243-0014, Japan

2. North Carolina State University, Raleigh, North Carolina 27695, United States

3. Imec, Kapeldreef 75, Leuven 3001, Belgium

4. Department of Chemistry, KU Leuven (University of Leuven), Kapeldreef 75, Leuven 3001, Belgium

Funder

IMEC

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.3c00965

Reference36 articles.

1. Considerations for Ultimate CMOS Scaling

2. From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity

3. Area-Selective Deposition: Fundamentals, Applications, and Future Outlook

4. Understanding chemical and physical mechanisms in atomic layer deposition

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