Molecular Layer Deposition of Organic–Inorganic Hafnium Oxynitride Hybrid Films for Electrochemical Applications-Reference-Cited by-同舟云学术

Molecular Layer Deposition of Organic–Inorganic Hafnium Oxynitride Hybrid Films for Electrochemical Applications

Published:2023-05-15 Issue:11 Volume:6 Page:5806-5816
ISSN:2574-0962
Container-title:ACS Applied Energy Materials
language:en
Short-container-title:ACS Appl. Energy Mater.

Author:

Ablat Hayrensa¹,Oh Il-Kwon¹²,Richey Nathaniel E.¹^ORCID,Oyakhire Solomon T.¹^ORCID,Yang Yufei³^ORCID,Zhang Wenbo³^ORCID,Huang William³^ORCID,Cui Yi³^ORCID,Bent Stacey F.¹^ORCID

Affiliation:

1. Department of Chemical Engineering, Stanford University, 433 Via Ortega, Stanford, California 94305, United States

2. Department of Electrical and Computer Engineering, Ajou University, Worldcup-ro 206, Suwon 16499, South Korea

3. Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States

Funder

TomKat Center for Sustainable Energy, Stanford University

Publisher

American Chemical Society (ACS)

Subject

Electrical and Electronic Engineering,Materials Chemistry,Electrochemistry,Energy Engineering and Power Technology,Chemical Engineering (miscellaneous)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsaem.3c00107

Reference68 articles.

1. Organic and inorganic–organic thin film structures by molecular layer deposition: A review

2. Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques

3. A brief review of atomic layer deposition: from fundamentals to applications

4. Oxygen-Deficient Titania with Adjustable Band Positions and Defects; Molecular Layer Deposition of Hybrid Organic–Inorganic Thin Films as Precursors for Enhanced Photocatalysis

5. Molecular Layer Deposition for Energy Conversion and Storage

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