Fabrication of High Aspect Ratio Poly(ethylene glycol)-Containing Microstructures by UV Embossing-Reference-Cited by-同舟云学术

Fabrication of High Aspect Ratio Poly(ethylene glycol)-Containing Microstructures by UV Embossing

Published:2003-04-15 Issue:10 Volume:19 Page:4371-4380
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Chan-Park Mary B.¹,Yan Yehai¹,Neo Wee Koon¹,Zhou Wenxiu¹,Zhang Jun¹,Yue Chee Yoon¹

Affiliation:

1. The Biological and Chemical Process Engineering Laboratory, The School of Mechanical and Production Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la026967t

Reference51 articles.

1. Printable organic and polymeric semiconducting materials and devices

2. Fully patterned all-organic thin film transistors

3. Plasma lithography — thin-film patterning of polymeric biomaterials by RF plasma polymerization I: Surface preparation and analysis

4. Patterning Mammalian Cells Using Elastomeric Membranes

5. Micropatterning of biomedical polymer surfaces by novel UV polymerization techniques

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