Investigating the Graphitization Mechanism of SiO2 Nanoparticles in Chemical Vapor Deposition
Author:
Affiliation:
1. IFW Dresden, P.O. Box 270116, 01171 Dresden, Germany
2. Technische Universität Dresden, 01062 Dresden, Germany
3. Department of Materials, University of Oxford, Parks Rd, Oxford, OX1 3PH, United Kingdom
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn9009278
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