Imaging of Atomic Layer Deposited (ALD) Tungsten Monolayers on α-TiO2(110) by X-ray Standing Wave Fourier Inversion-Reference-Cited by-同舟云学术

Imaging of Atomic Layer Deposited (ALD) Tungsten Monolayers on α-TiO2(110) by X-ray Standing Wave Fourier Inversion

Published:2006-06-01 Issue:25 Volume:110 Page:12616-12620
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Kim Chang-Yong¹,Elam Jeffrey W.¹,Pellin Michael J.¹,Goswami Dipak K.¹,Christensen Steven T.¹,Hersam Mark C.¹,Stair Peter C.¹,Bedzyk Michael J.¹

Affiliation:

1. Department of Materials Science and Engineering, Institute for Environmental Catalysis, and Department of Chemistry, Northwestern University, Evanston, Illinois 60208, and Energy Systems, Materials Science, and Chemistry Divisions, Argonne National Laboratory, Argonne, Illinois 60439

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp061391s

Reference49 articles.

1. Recent conceptual advances in the catalysis science of mixed metal oxide catalytic materials

2. Alternative dielectrics to silicon dioxide for memory and logic devices

3. Smart single-chip gas sensor microsystem

4. Selective tungsten CVD on submicron contact hole

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