Nonswelling Negative Resists Incorporating Chemical Amplification-Reference-Cited by-同舟云学术

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Nonswelling Negative Resists Incorporating Chemical Amplification

Published:1989-07-23 Issue: Volume: Page:74-85
ISSN:0097-6156
Container-title:ACS Symposium Series
language:
Short-container-title:

Author:

Fréchet Jean M. J.¹,Matuszczak Stephen¹,Stöver Harald D. H.¹²,Willson C. Grant³,Reck Berndt³

Affiliation:

1. Department of Chemistry, Baker Laboratory, Cornell University, Ithaca, NY 14853—1301

2. Current address: Department of Chemistry, McMaster University, Hamilton, Ontario L8S 4M1, Canada

3. IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, CA 95120—6099

Publisher

American Chemical Society

Link

https://pubs.acs.org/doi/pdf/10.1021/bk-1989-0412.ch005

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectroscopic and Microscopic Analysis of Photo-cross-linked Vinylbenzylthymine Copolymers for Photoresist Applications;Chemistry of Materials;2006-05-09

2. Use of 2-(N-methyl-N-phenylamino)-1-phenylethanol as synergist in UV-curing applications;Journal of Photochemistry and Photobiology A: Chemistry;2002-11

3. Discovery of dendrimers and dendritic polymers: A brief historical perspective*;Journal of Polymer Science Part A: Polymer Chemistry;2002-06-21

4. Recent Developments in the Chemistry of Lithography for Electronics Production;Plastics for Electronics;1999

5. Chemically amplified resists: Chemistry and processes;Advanced Materials for Optics and Electronics;1994-03

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