Hydrophilic/Hydrophobic Film Patterning by Photodegradation of Self-Assembled Alkylsilane Multilayers and Its Applications-Reference-Cited by-同舟云学术

Hydrophilic/Hydrophobic Film Patterning by Photodegradation of Self-Assembled Alkylsilane Multilayers and Its Applications

Published:2014-08-13 Issue:33 Volume:30 Page:10118-10126
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Ni Lingli¹,Dietlin Céline¹,Chemtob Abraham¹,Croutxé-Barghorn Céline¹,Brendlé Jocelyne²

Affiliation:

1. Laboratory of Photochemistry and Macromolecular Engineering, ENSCMu, University of Haute-Alsace, 3 bis rue Alfred Werner, 68093 Mulhouse Cedex, France

2. Institute of Material Science of Mulhouse, CNRS, UMR 7361, University of Haute-Alsace, 3 bis rue Alfred Werner, 68093 Mulhouse Cedex, France

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la5023938

Reference54 articles.

1. Patterning Self-Assembled Monolayers: Applications in Materials Science

2. Patterning self-assembled monolayers

3. Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates

4. Deep UV Photochemistry of Chemisorbed Monolayers: Patterned Coplanar Molecular Assemblies

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