Metal-Assisted Silicon Chemical Etching Using Self-Assembled Sacrificial Nickel Nanoparticles Template for Antireflection Layers in Photovoltaic and Light-Trapping Devices-Reference-Cited by-同舟云学术

Metal-Assisted Silicon Chemical Etching Using Self-Assembled Sacrificial Nickel Nanoparticles Template for Antireflection Layers in Photovoltaic and Light-Trapping Devices

Published:2019-10-16 Issue:11 Volume:2 Page:7025-7031
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Kong Lingyu¹²³^ORCID,Chiam Sing Yang²^ORCID,Chim Wai Kin³^ORCID

Affiliation:

1. NUS Graduate School for Integrative Sciences and Engineering, National University of Singapore, 28 Medical Drive, Singapore 117456

2. Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 2 Fusionopolis Way, Innovis, Singapore 138634

3. Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117583

Funder

National University of Singapore, Graduate School for Integrative Sciences and Engineering

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.9b01528

Reference39 articles.

1. Damage-Free Smooth-Sidewall InGaAs Nanopillar Array by Metal-Assisted Chemical Etching

2. Porous silicon nanowires

3. 13.2% efficiency Si nanowire/PEDOT:PSS hybrid solar cell using a transfer-imprinted Au mesh electrode

4. Versatile control of metal-assisted chemical etching for vertical silicon microwire arrays and their photovoltaic applications

5. Surface engineered porous silicon for stable, high performance electrochemical supercapacitors

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