Influence of the slight adjustment of oxides on the structural and physico-chemical properties of thin film transistor-liquid crystal display substrate glass

Author:

Cui Jiedong12ORCID,Cao Xin12,Shi Lifen12,Zhong Zhaojin12,Wang Pingping12,Ma Liyun12

Affiliation:

1. State Key Laboratory of Advanced Technology for Float Glass, No. 751 Donghai Road, Bengbu, Anhui 233018, People's Republic of China

2. Bengbu Design & Research Institute for Glass Industry Co., Ltd. No. 1047 Tushan Road, Bengbu, Anhui 233018, People's Republic of China

Abstract

By the slight adjustment of oxides constituting thin film transistor-liquid crystal display (TFT-LCD) substrate glass, including equal mole fraction substitution of Al 2 O 3 , GeO 2 , B 2 O 3 , P 2 O 5 and ZrO 2 for SiO 2 , as well as the substitution of CaO for SrO with the total contents unchanged, the structural and physico-chemical properties of the glass was investigated by Raman spectroscopy and other measurements. The results showed that the short-range disorder brought by the substitution of GeO 2 , B 2 O 3 and P 2 O 5 for SiO 2 could weaken the stability and compactness of the glass network, and the physico-chemical properties deteriorated, while the process of glass melting would become easier accordingly. The short-range disorder by the substitution of ZrO 2 for SiO 2 with 1% mole fraction showed a little difference with other samples. Finally, the substitution of modified cations, such as CaO and SrO, showed a smaller variation compared with the substitution of network formers. On the condition of 1% mole fraction substitution of oxides investigated, the variation of samples showed a reasonable change and the performance was basically all satisfied for the use of TFT-LCD substrate.

Funder

National Key Research and Development Program of China

Publisher

The Royal Society

Subject

Multidisciplinary

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