In-Situ Optical Monitoring of Atmospheric Pressure Plasma During Organic Surface Removal

Abstract

A real-time In-Situ optical monitoring of atmospheric pressure plasma process during the removal of organic substances is presented. Two optical monitoring methods of optical emission spectroscopy (OES) and optical plasma monitoring system (OPMS) are employed. OES is used for the analysis plasma chemistry associated with the injected process gas and by product, and it is useful for the endpoint detection of the strip of organic materials. OPMS is useful for the detection of abnormal discharge, known as arc. We presented not only the chemical analysis of the plasma, but also the physical understanding of the monitored plasma using OES data. This paper demonstrates the usefulness of optical monitoring of plasma and plasma process for atmospheric plasma.