Characterization of Subgap Density-of-States by Sub-Bandgap Optical Charge Pumping in In0.53Ga0.47As Metal-Oxide-Semiconductor Field-Effect Transistors
-
Published:2020-07-01
Issue:7
Volume:20
Page:4287-4291
-
ISSN:1533-4880
-
Container-title:Journal of Nanoscience and Nanotechnology
-
language:en
-
Short-container-title:j nanosci nanotechnol
Author:
Yoo Han Bin1,
Kim Seong Kwang2,
Kim Junyeap1,
Yu Jintae1,
Choi Sung-Jin1,
Kim Dae Hwan1,
Kim Dong Myong1
Affiliation:
1. School of Electrical Engineering, Kookmin University, Seoul 02701, Korea
2. School of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon 34141, Korea
Abstract
We report an experimental characterization of the interface states (Dit(E)) by using the subthreshold drain current with optical charge pumping effect in In0.53Ga0.47As metal-oxide-semiconductor fieldeffect transistors (MOSFETs). The interface
states are derived from the difference between the dark and photo states of the current–voltage characteristics. We used a sub-bandgap photon (i.e., with the photon energy lower than the bandgap energy, Eph < Eg) to optically excite trapped carriers
over the bandgap in In0.53Ga0.47As MOSFETs. We combined a gate bias-dependent capacitance model to determine the channel length-independent oxide capacitance. Then, we estimated the channel length-independent interface states in In0.53Ga0.47As MOSFETs
having different channel lengths (Lch = 5, 10, and 25 [μm]) for a fixed overlap length (Lov = 5 [μm]).
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering