Bandgap Modulation of Glancing Angle Deposition Aided Ag Nanoparticles Covered TiO2 Thin Film by High Temperature Annealing

Abstract

Glancing Angle Deposition (GLAD) technique has been used to fabricate the Ag nanoparticles (NPs) over TiO2 thin film (TF) on the n-Si substrate. The deposited Ag NPs are in the size of 3–5 nm. Open-air annealing has been done at 500 °C and 600 °C for the n-Si/TiO2 TF/Ag NP samples. High Resolution X-ray Diffraction (HRXRD) peaks were identified to calculate the crystalline size of the NPs and rutile phase of the annealed sample were exhibited. Morphological analysis has been done for the sample using Field Emission Scanning Electron Microscopy (FESEM), Energy Dispersive Spectroscopy (EDS) and Atomic Force Microscopy (AFM). The enhancement of plasmonic absorption and modulation in the bandgap for the annealed Ag NPs surrounded TiO2 TF has been verified by UV-Vis Spectroscopy and the bandgap has been calculated using Tauc plot. An overall 2.5 fold and 3 fold enhancement has been observed in the UV region and visible region for n-Si/TiO2 TF/Ag NP annealed at 500 °C and 600 °C samples as compared to the n-Si/TiO2 TF/Ag NP as-deposited samples. The modulation of bandgap due to the sub-band transition and Localized Surface Plasmon Resonance (LSPR) effect of Ag NPs and relevant sub-band transition due to change in annealing temperature has been reported.