Annealing of Heavily Boron-Doped Silicon: Effect on Electrical and Thermoelectric Properties
Author:
Affiliation:
1. Università di Milano Bicocca, Dipartimento di Scienza dei Materiali, via R. Cozzi 55, I-20125, Milano, Italy
Publisher
American Scientific Publishers
Subject
Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Recent Advances on Thermoelectric Silicon for Low-Temperature Applications;Materials;2022-02-06
2. Exceptional thermoelectric power factors in hyperdoped, fully dehydrogenated nanocrystalline silicon thin films;Applied Physics Letters;2021-12-27
3. Silicon Nanowires: A Breakthrough for Thermoelectric Applications;Materials;2021-09-14
4. Facile and Precise Detection of Boric Acid via Coulometric Titration;Science of Advanced Materials;2017-09-01
5. Effect of the Annealing on the Low-Temperature Charge Transport Properties of Heavily Boron-Doped Nanocrystalline Silicon Films for Thermoelectric Applications;Energy Harvesting and Systems;2016-10-01
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