Self-Organization of CrSi2 Nanoislands on Si(111) and Growth of Monocrystalline Silicon with Buried Multilayers of CrSi2 Nanocrystallites

Abstract

The process of self-organization of CrSi2 nanosize islands on Si(111)7×7 surface has been investigated during reactive deposition (RDE) of Cr at 500 °C by methods of low energy diffraction (LEED) and differential reflectance spectroscopy (DRS). Morphology of grown samples has been studied by atomic force microscopy (AFM). DRS data have demonstrated the semiconductor nature of silicide islands from the beginning of Cr deposition at 500 °C. The optimal temperature (750 °C) and optimal Si thickness (50 nm) have been determined for silicon molecular epitaxy (MBE) growth atop CrSi2 nanosize islands. Monolithic silicon–silicide heterostructures with multilayers of CrSi2 nanosize crystallites have been grown.