Development of a Two-Chamber Process for Self-Assembling a Fluorooctatrichlorosilane Monolayer for the Nanoimprinting of Full-Track Nanopatterns with a 35 nm Half Pitch-Reference-Cited by-同舟云学术

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Development of a Two-Chamber Process for Self-Assembling a Fluorooctatrichlorosilane Monolayer for the Nanoimprinting of Full-Track Nanopatterns with a 35 nm Half Pitch

Published:2011-07-01 Issue:7 Volume:11 Page:5921-5927
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:J. Nanosci. Nanotech.

Author:

Choi Sungwoo,Han Jungjin,Lim Jiseok,Kim Joongeok,Kim Hokwan,Kim Seok-Min,Kang Shinill

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ferroelectric Polymer Nanostructures: Fabrication, Structural Characteristics and Performance Under Confinement;Journal of Nanoscience and Nanotechnology;2014-02-01

2. Modification of Mold Surface Properties;Micro/Nano Replication;2012-03-19

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