Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection-Reference-Cited by-同舟云学术

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

Published:2018-06 Issue:03 Volume:189 Page:323-334
ISSN:0042-1294
Container-title:Uspekhi Fizicheskih Nauk
language:ru
Short-container-title:Usp. Fiz. Nauk

Author:

Abramenko D.B.¹,Antsiferov P.S.¹,Astakhov D.I.¹,Vinokhodov Aleksandr Yu.²,Vichev Il'ya Yu.³,Gayazov R.R.¹,Grushin Aleksandr S.³,Dorokhin L.A.¹,Ivanov Vladimir V.¹,Kim Dmitrii A.³,Koshelev Konstantin N.¹,Krainov Pavel V.⁴,Krivokorytov Mikhail S.¹,Krivtsun Vladimir M.¹,Lakatosh B.V.⁴,Lash Aleksandr A.²,Medvedev Vyacheslav V.¹,Ryabtsev Aleksandr N.¹,Sidel'nikov Yu.V.¹,Snegirev E.P.¹,Solomyannaya Anna D.³,Spiridonov Maksim V.⁵⁶,Tsygvintsev Il'ya P.³,Yakushev Oleg F.⁶,Yakushkin A.A.²

Affiliation:

1. Institute of Spectroscopy, Russian Academy of Sciences, ul. Fizicheskaya 5, Troitsk, Moscow, 108840, Russian Federation

2. EUV Labs, Ltd., Sirenevy bulvar 1, Troitsk, Moscow, 142191, Russian Federation

3. M.V. Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Miusskaya pl. 4, Moscow, 125047, Russian Federation

4. Moscow Institute of Physics and Technology (State University), Institutskii per. 9, Dolgoprudnyi, Moscow Region, 141700, Russian Federation

5. Prokhorov General Physics Institute of the Russian Academy of Sciences, ul. Vavilova 38, Moscow, 119942, Russian Federation

6. Lebedev Physical Institute, Russian Academy of Sciences, Leninsky prosp. 53, Moscow, 119991, Russian Federation

Publisher

Uspekhi Fizicheskikh Nauk (UFN) Journal

Subject

General Physics and Astronomy

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