HPLC–DAD method for investigating pantoprazole for its stress-dependent degradation by photolysis and oxidation

Author:

Al Bratty Mohammad1,Thangavel Neelaveni1,Peraman Ramalingam2,Kumar Vinod3,Reddy Padmanabha3,Nagappan Krishna Veni4,Al Hazmi Hassan1

Affiliation:

1. 1 Department of Pharmaceutical Chemistry, Faculty of Pharmacy, Jazan University, Jazan, P.O. Box 114, KSA 45142

2. 2 RERDS-Centre for Pharmaceutical Research, Raghavendra Institute of Pharmaceutical Education and Research Campus, Anantapuramu, Andhra Pradesh, India 515721

3. 3 Department of Pharmaceutical Analysis, Raghavendra Institute of Pharmaceutical Education and Research – Autonomous, Anantapuramu, Andhra Pradesh, India 515721.

4. 4 Department of Pharmaceutical Analysis, JSS College of Pharmacy, Ooty [A Constituent College – JSS Academy of Higher Education & Research], The Nilgiris, Tamil Nadu, India 643001.

Abstract

A reversed-phased high-performance liquid chromatography–diode-array detection (HPLC–DAD) method has been developed for investigating the stress-dependent degradation of pantoprazole (PTZ) by a photolytic and oxidative mechanism. The developed method separated PTZ from its degradation products on a C18 column with a mobile phase consisted of methanol and water (60:40, v/v; pH 3.0) at a flow rate of 1 mL/min. The linear regression coefficient of 0.9995 was obtained for a concentration range from 5 to 25 μg/mL. The % relative standard deviation for repeatability and intermediate precision were below 0.5% and 1.5%, respectively, while the sensitivity of the method was demonstrated by a limit of detection value of 0.25 μg/mL. The stress sample analyses for PTZ results revealed the formation of a total of 18 degradation products, and out of them, 9 degradation products were common for both photolytic and oxidative degradations. Further, the oxidation by azobisisobutyronitrile produced the highest number of degradation products (11 impurities), 3 of which are more hydrophobic than PTZ. In photolytic degradation, 8 and 7 degradation products were observed with UV radiation and sunlight exposure, respectively. Furthermore, the degradation of pantoprazole sodium injection formulation was carried out under the same stress conditions, and it revealed the formation of 3 common impurities under both stress conditions, but other impurities were not detected in the formulations. Finally, 3 common impurities formed in formulations of PTZ injections, viz., sulfone, N-oxide, and N-oxide sulfone impurities, were identified by spike analyses.

Publisher

Akademiai Kiado Zrt.

Subject

General Chemistry

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