Author:
Sichanugrist Porponth,Pingate Nirut,Piromjit Channarong
Abstract
AbstractMicrocrystalline silicon oxide (μc-SiO) deposited from the gas mixture of silane and carbondioxide using VHF plasma was reported by authors to be the promising material for thin-film silicon solar cell fabricated on glass substrate, comparing with the conventional amorphous silicon oxide or microcrystalline silicon p-layer. High-performance, tandem-type solar cell with amorphous and microcrystalline cells (double cells) has been achieved by ap-plying this μc-SiO to the p-layer of both cells.Further work has been extended to a-Si tandem type solar cell with triple cell configu-ration using amorphous silicon oxide (a-SiO), amorphous silicon germanium (a-SiGe) and microcrystalline Si (μc-Si) as the top, middle and bottom cells, respectively. Up to now, cell efficiency of 15.7 % has been achieved using this novel μc-SiO.
Publisher
Springer Science and Business Media LLC
Reference4 articles.
1. 2 Yamanoto K. et al., Proc. Of 3rd Photovoltaic Energy Conversion, 2789 (2003)
2. Amorphous and nanocrystalline silicon-based multi-junction solar cells
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献