Abstract
ABSTRACTWork on GexSi1−x strained layer epitaxy is reviewed including: The limits of single layer and superlattice growth, and comparison with theory; Physical properties including bandgap and heterostructure band alignment; Work on non-random alloys; Device applications including MODFET's, PIN and APD photodetectors.
Publisher
Springer Science and Business Media LLC
Cited by
4 articles.
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